ALPHA-8SE™ i
TEL's 200 mm vertical batch thermal deposition system, a 2018 renewal of the earlier model. It processes up to 150 wafers at a time.
Specifications
| Type | Vertical batch thermal processing and deposition |
|---|---|
| Wafer size | 150 / 200 mm |
| Wafers per batch | Up to 150 |
Specifications as published by the maker. See the sources below.
Overview
ALPHA-8SE i is a 200 mm vertical batch thermal processing and deposition system from Tokyo Electron (TEL). It was released in 2018 as a renewal of the earlier ALPHA-8SE, built around three concepts: renew, inherit and evolve.
Parts of the earlier model, launched more than 20 years ago, that were likely to be discontinued were replaced with current designs, and parts are shared with TEL's 300 mm vertical batch furnaces for stable, continued operation. It supports 150 and 200 mm wafers and processes up to 150 wafers at a time. Applications range from oxidation and annealing to CVD Si (poly-Si, a-Si), SiN, SiO₂ and ALD including high-k.
Remote monitoring was improved by capturing more tool parameters, and the tool adds automatic logout on the operating screen and low-outgassing exhaust line heaters. It complies with SEMI S2 and CE marking.
Key features
- 200 mm vertical batch furnace
- Up to 150 wafers at a time
- Parts shared with 300 mm furnaces
- Complies with SEMI S2 and CE marking
Applications
- Oxidation and annealing on 200 mm lines
- CVD and ALD
Other diffusion furnaces
- QUIXACE®-II · Kokusai Electric
- EVAROS™ · Tokyo Electron (TEL)
- TELFORMULA™ · Tokyo Electron (TEL)
- TELINDY PLUS · Tokyo Electron (TEL)
- H83 / H84 · ULVAC
More from Tokyo Electron (TEL)
- ANTARES™ · Dry cleaning equipment
- Cellcia™ · Wafer probers
- CELLESTA™-i · Single-wafer cleaning equipment
- CELLESTA™-i MD · Single-wafer cleaning equipment
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
- Certas LEAGA™ · Dry cleaning equipment
Sources
Diffusion furnaces
Last updated: October 23, 2026