CELLESTA™-i MD
TEL's single-wafer cleaning system for cleaning processes at 10 nm and below. Its own IPA dispensing technology suppresses pattern collapse.
Specifications
| Type | Single-wafer cleaning (300 mm) |
|---|---|
| Throughput | 650 wph |
| Drying method | New IPA drying, SMD |
Specifications as published by the maker. See the sources below.
Overview
CELLESTA-i MD is a single-wafer cleaning system for 300 mm wafers from Tokyo Electron (TEL). It supports the latest cleaning processes at the 10 nm node and below.
Building on the basic concept of CELLESTA-i, it enables damage-free cleaning of leading-edge fine patterns and greatly improves particle removal. New atmosphere control in the chamber after cleaning and TEL's own IPA dispensing technology let even extremely fine patterns dry without collapsing.
Improved chemical recycling lowers operating cost. It can also clean wafers with exposed metals such as Cu. Throughput is 650 wph, and it received the Semiconductor of the Year 2014 award.
Key features
- Damage-free cleaning
- TEL's own IPA dispensing to suppress pattern collapse
- Chemical recycling
- 650 wph
Applications
- Pre- and post-process cleaning and wet etching
- Cleaning with exposed metal
Other single-wafer cleaning equipment
- SU-2000 · SCREEN Holdings
- SU-3300 · SCREEN Holdings
- CELLESTA™-i · Tokyo Electron (TEL)
More from Tokyo Electron (TEL)
- ALPHA-8SE™ i · Diffusion furnaces
- ANTARES™ · Dry cleaning equipment
- Cellcia™ · Wafer probers
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
- Certas LEAGA™ · Dry cleaning equipment
- CLEAN TRACK™ LITHIUS Pro™ · Coater/developers
Sources
Single-wafer cleaning equipment
Last updated: October 23, 2026