Dry cleaning equipment

Certas LEAGA™

Name: Certas LEAGA
Brand: Tokyo Electron (TEL)

Tokyo Electron's gas chemical etch system for 300 mm wafers, which etches and cleans surfaces without liquid chemicals. It uses no plasma and leaves no watermarks.

Maker: Tokyo Electron (TEL) · Official product page

Specifications

Wafer size	300 mm
Type	Gas chemical (dry) etching, plasma-less
Chamber configuration	Up to 6 chambers (2 wafers processed at once)
Main applications	Pre-clean before silicon contacts, oxide removal, selective etching

Specifications as published by the maker. See the sources below.

Overview

Certas LEAGA is a gas chemical etch system for 300 mm wafers from Tokyo Electron. It etches and cleans surfaces without liquid chemicals, with low environmental impact and high throughput, and is positioned as a core tool for isotropic etching.

Its fully dry process units produce no watermarks, show unique selectivity when etching various oxides, and allow clean control of fine interfaces. Because it uses no plasma, it runs with high uptime at low cost. Combining it with TEL cleaning systems adds flexibility.

It processes 2 wafers at once, can carry up to 6 process chambers, and its process units can be rearranged freely. It is used from volume production to next-generation development for surface cleaning before silicon contacts, removal and etch-back of silicon oxide, selective etching of high-aspect-ratio 3D structures and fine recesses.

Key features

Fully dry gas chemical etching without liquid chemicals
Plasma-less for high uptime and low cost
2 wafers processed at once, up to 6 chambers
Unique selectivity for various oxides, no watermarks

Applications

Surface cleaning before silicon contacts
Removal and etch-back of silicon oxide
Selective etching and recessing of 3D structures

Other dry cleaning equipment

ANTARES™ · Tokyo Electron (TEL)
RISE-300 · ULVAC

All dry cleaning equipment and Japanese suppliers

Sources

Tokyo Electron: Certas series product page