Wet etching equipment

EXPEDIUS™-i

Name: EXPEDIUS-i
Brand: Tokyo Electron (TEL)

Tokyo Electron's batch automated wet cleaning system for 300 mm wafers. It handles up to 50 wafers per batch, including highly selective oxide/nitride wet etching for 3D NAND.

Maker: Tokyo Electron (TEL) · Official product page

Specifications

Wafer size	300 mm
Type	Batch (up to 50 wafers per batch)
Throughput	1,000 wph
Main applications	Selective SiN wet etching, pre- and post-process cleaning, resist strip

Specifications as published by the maker. See the sources below.

Overview

EXPEDIUS-i is a batch automated wet cleaning system for 300 mm wafers from Tokyo Electron. It processes up to 50 wafers at a time and runs a range of chemical treatments in multiple tanks. It is based on the EXPEDIUS+ automated wet station, with higher process performance and productivity.

Throughput is 1,000 wafers per hour, 150% higher than the previous system. In addition to conventional uses such as pre-oxidation and pre-diffusion cleaning, post-etch cleaning and resist stripping, it supports the highly selective oxide/nitride wet etching in growing demand for 3D NAND.

Optimized chemical tanks, DI water rinse tanks and drying improve cleaning and stripping performance, and selective etch technology improves control and stability during etching. The improved drying function shortens processing time substantially while suppressing the collapse of fragile patterns.

Key features

Batch automated wet cleaning of up to 50 wafers per batch
Throughput of 1,000 wph (150% higher than the previous system)
Selective SiN wet etching for 3D NAND
Improved drying that suppresses pattern collapse

Applications

Selective SiN wet etching in 3D NAND
Pre-oxidation and pre-diffusion cleaning, post-etch cleaning
Resist stripping

Other wet etching equipment

SP-2100 · SCREEN Holdings
SU-3300 · SCREEN Holdings

All wet etching equipment and Japanese suppliers

Sources

Tokyo Electron: EXPEDIUS series product page