Wet etching equipment
Wet etching equipment removes films with liquid chemicals. Because it etches in all directions, it is used where shape control is less critical than selectivity, throughput and low damage.
What it does
Typical uses include selective removal of silicon nitride in 3D NAND, oxide removal and stripping steps. Tools come as batch and single-wafer systems.
Products (3)
- SP-2100 · SCREEN Holdings
A single-wafer spin processor for 76 to 200 mm Si, SiC, GaN, LiTaO₃ and other wafers. It is used for cleaning, etching and metal etching.
- SU-3300 · SCREEN Holdings
SCREEN's single-wafer cleaning system. It carries up to 24 chambers in 4 levels × 6 towers and performs chemical wet etching and cleaning with high productivity.
- EXPEDIUS™-i · Tokyo Electron (TEL)
Tokyo Electron's batch automated wet cleaning system for 300 mm wafers. It handles up to 50 wafers per batch, including highly selective oxide/nitride wet etching for 3D NAND.
Japanese makers in this category
- SCREEN Holdings · 2 product(s) listed
- Tokyo Electron (TEL) · 1 product(s) listed
Other front-end equipment
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Last updated: October 23, 2026