SU-3300
SCREEN's single-wafer cleaning system. It carries up to 24 chambers in 4 levels × 6 towers and performs chemical wet etching and cleaning with high productivity.
Maker: SCREEN Holdings · Official product page
Specifications
| Type | Single wafer (chemical processing) |
|---|---|
| Chamber configuration | Up to 24 chambers (4 levels × 6 towers) |
| Key technologies | Drying technology that suppresses pattern collapse, APAC2 (in-chamber airflow control) |
| Main applications | Wet etching and cleaning (high aspect ratio patterns) |
Specifications as published by the maker. See the sources below.
Overview
SU-3300 is a single-wafer cleaning system from SCREEN Semiconductor Solutions. With 4 levels × 6 towers, it can carry 24 chambers, one of the largest numbers in the industry, for high productivity. It also supports service chamber by chamber (single chamber service).
The latest drying technology controls the gas-liquid interface on the wafer accurately and quickly, keeping temperature and humidity in the chamber always optimal. This greatly reduces collapse of high aspect ratio patterns that have become fragile with scaling.
It uses APAC2, a further development of the APAC ultra-clean technology on SU-3200, and ASC (Advanced Stream Control), which precisely controls airflow in the chamber, improves the processing environment and reduces chamber-to-chamber differences. The successor SU-3400 cuts footprint by 30% with the same 24 chambers.
Key features
- Up to 24 chambers (4 levels × 6 towers)
- Drying technology that controls the gas-liquid interface to suppress collapse of high aspect ratio patterns
- Ultra-clean chambers with APAC2 (ASC airflow control)
- Single chamber service
Applications
- Single-wafer cleaning of advanced devices
- Chemical wet etching
Also listed under: Single-wafer cleaning equipment, Power semiconductor manufacturing equipment
Other wet etching equipment
- SP-2100 · SCREEN Holdings
- EXPEDIUS™-i · Tokyo Electron (TEL)
More from SCREEN Holdings
- CW-2000 · Batch wafer cleaning equipment
- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- FC-3100 · Batch wafer cleaning equipment
- FC-821L · Batch wafer cleaning equipment
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
Sources
Wet etching equipment
Last updated: October 23, 2026