Wafer substrate inspection equipment

MAGICS M5640

A wafer defect inspection and review system that detects tiny defects from wafer manufacturing with 63 laser beams.

Maker: Lasertec · Official product page

Specifications


Light source532 nm
Maximum detection sensitivity50 nm (PSL on mirror-polished wafers)
Inspection time22 minutes per wafer (300 mm, normal scan)

Specifications as published by the maker. See the sources below.

Overview


MAGICS M5640 is Lasertec's wafer defect inspection and review system, announced in November 2008. It detects the tiny defects that next-generation processes require.

It offers higher sensitivity to killer defects from the wafer manufacturing process, such as PID, shallow scratches, COP and SF. 63 laser beams and a newly designed high-speed stage give high throughput. It can sensitively inspect mirror-polished wafers, epitaxial wafers, SOI wafers, quartz wafers and others.

It has fast, high-resolution review with confocal optics and can mark defect locations with a diamond tip without generating particles. Maximum detection sensitivity is 50 nm (PSL), and inspection time for 300 mm is 22 minutes. It is used for outgoing and incoming wafer inspection and for developing materials such as polishing and cleaning agents.

Key features


Applications


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More from Lasertec


Sources


  1. Lasertec: MAGICS M5640 product page

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Last updated: October 23, 2026