LX series
A multi-wavelength wafer inspection system that quickly inspects film thickness, etch variation and CD across the whole wafer using light of several wavelengths.
Maker: Lasertec · Official product page
Specifications
| Type | Multi-wavelength, high-speed full-wafer imaging |
|---|---|
| Inspection target | Variation in film thickness, etch amount and CD |
| Configuration | High-resolution model, high-throughput model |
Specifications as published by the maker. See the sources below.
Overview
The LX series is Lasertec's multi-wavelength wafer inspection system. Using light of several wavelengths, it quickly inspects film thickness, etch variation and CD across the whole wafer.
Fast full-wafer imaging makes it suited to monitoring volume production processes. Proprietary high-brightness, low-noise multi-wavelength optics raise sensitivity, and it has its own analysis algorithms for different targets such as film thickness, etch amount and CD. A high-resolution model and a high-throughput model are available depending on the application.
It is used to monitor resist thickness and CD variation in lithography, for film thickness control and tool QC in deposition, and to monitor depth variation in etching.
Key features
- Multi-wavelength full-wafer inspection
- Covers film thickness, etch amount and CD
- High-resolution and high-throughput models
Applications
- Monitoring resist thickness and CD
- Process monitoring of deposition and etching
Other macro inspection equipment
- CIEL series · Lasertec
- EZ300 · Lasertec
- AMI-5700 · Nikon
- OPTISTATION-3200 · Nikon
- ZI-2000 · SCREEN Holdings
- ZI-3600 · SCREEN Holdings
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Sources
Macro inspection equipment
Last updated: October 23, 2026