NSR-2205iL1
Nikon's i-line stepper with 5x reduction projection. It handles many devices and wafer materials, such as power semiconductors and MEMS.
Maker: Nikon · Official product page
Specifications
| Light source and NA | i-line (365 nm), 0.45 |
|---|---|
| Resolution | 350 nm or less (with options) |
| Reduction ratio and exposure field | 1:5, 22 × 22 mm |
| Wafer size | 2 to 8 inch (optional) |
Specifications as published by the maker. See the sources below.
Overview
NSR-2205iL1 is Nikon's i-line stepper with 5x reduction projection. It offers excellent cost performance and, regardless of wafer material, is used to produce many devices such as power semiconductors, communication semiconductors and MEMS.
It handles various wafer sizes, thicknesses and warpage, and wafer sizes can be switched. Wide DOF, which widens the depth of focus range, and multi-point AF strengthen support for compound semiconductor processes. Options include transparent wafers, 2 to 8-inch wafers and IR-transmission backside alignment.
It is highly compatible with Nikon's existing i-line tools and can reuse their masks and recipes, making it suited to replacing them. Resolution is 350 nm or less, NA 0.45, maximum exposure field 22 × 22 mm and same-tool overlay accuracy (SMO) 70 nm or less (all with options).
Key features
- Works with any wafer material and size
- Wide DOF and multi-point AF
- Backside alignment (optional)
- Compatibility with existing tools
Applications
- Power semiconductors
- Communication semiconductors
- MEMS
Other i-line steppers
- FPA-3030i5a · Canon
- FPA-3030i6 · Canon
- FPA-3030iWa · Canon
- FPA-5550iX · Canon
- FPA-5550iZ2 · Canon
- NSR-SF155 · Nikon
More from Nikon
Sources
Last updated: October 23, 2026