NSR-S215D
Nikon's KrF scanner that handles both 200 mm and 300 mm wafers and is highly compatible with existing KrF scanners.
Maker: Nikon · Official product page
Specifications
| Light source and NA | KrF (248 nm), 0.82 |
|---|---|
| Resolution | 110 nm or less |
| Wafer size | Both 200 and 300 mm |
| Throughput | 330 wafers per hour or more (200 mm, 46 shots) / 200 or more (300 mm, 96 shots) |
Specifications as published by the maker. See the sources below.
Overview
NSR-S215D is Nikon's KrF scanner. It handles both 200 mm and 300 mm wafers and is used for efficient production of many semiconductor devices, mainly at mature nodes.
A common body platform raises throughput while giving the same exposure performance as earlier tools. It handles warped wafers and can automate recipe creation. It is highly compatible with Nikon's existing KrF scanners and can share masks and recipes with them, making it suited to replacing them.
The design was revisited down to the parts level for long-term use, improving maintainability. Resolution is 110 nm or less, NA 0.82, maximum exposure field 26 × 33 mm and overlay accuracy MMO 15 nm or less. With options, throughput is 330 wafers per hour or more for 200 mm (46 shots) and 200 wafers per hour or more for 300 mm (96 shots).
Key features
- Handles both 200 and 300 mm
- Shares masks and recipes with existing tools
- Handles warped wafers
- Designed for long-term support
Applications
- Devices at mature nodes
- Replacement of existing KrF tools
Other duv lithography systems
- FPA-3030EX6 · Canon
- FPA-6300ES6a · Canon
- FPA-6300ESW · Canon
- NSR-S220D · Nikon
- NSR-S322F · Nikon
- NSR-S333F · Nikon
- NSR-S625E · Nikon
- NSR-S635E · Nikon
More from Nikon
- AMI-5700 · Macro inspection equipment
- DSP-100 · Laser direct imaging systems
- Litho Booster · Overlay metrology
- NSR-2205iL1 · i-line steppers
- NSR-S636E · DUV lithography systems
- NSR-SF155 · i-line steppers
- OPTISTATION-3200 · Macro inspection equipment
Sources
Last updated: October 23, 2026