FPA-3030iWa
A low-NA i-line stepper for power and IoT devices. It exposes a wide 52 × 52 mm field in one shot.
Maker: Canon · Official product page
Specifications
| Resolution | 0.8 µm or less |
|---|---|
| NA and field size | 0.24 to 0.16 (automatically variable), 52 × 52 mm |
| Wafer size | 50 to 200 mm |
Specifications as published by the maker. See the sources below.
Overview
FPA-3030iWa is Canon's low-NA i-line stepper for power devices and IoT-related devices on small substrates of 200 mm and below. It uses the FPA-3030 platform, which has proven highly reliable in the market.
With a wide 52 mm × 52 mm field and a projection lens whose NA can be varied from 0.16 to 0.24, it exposes accurate, uniform line widths while keeping a large depth of focus.
A wafer transfer system selectable from 50 mm to 200 mm can transfer many kinds of compound semiconductor wafers, and it can now also transfer transparent substrates such as SiC and warped substrates. An off-axis alignment scope that does not go through the projection lens allows measurement across a wide range of wavelengths.
Key features
- Wide 52 × 52 mm field
- Large depth of focus with low NA
- Transfers transparent and warped substrates
Applications
- Power devices
- IoT-related devices
Other i-line steppers
- FPA-3030i5a · Canon
- FPA-3030i6 · Canon
- FPA-5550iX · Canon
- FPA-5550iZ2 · Canon
- NSR-2205iL1 · Nikon
- NSR-SF155 · Nikon
More from Canon
- FPA-1200NZ2C · Nanoimprint lithography (NIL)
- FPA-3030EX6 · DUV lithography systems
- FPA-5520iV · Wafer-level packaging equipment
- FPA-6300ES6a · DUV lithography systems
- FPA-6300ESW · DUV lithography systems
- FPA-8000iW · Wafer-level packaging equipment
Sources
Last updated: October 23, 2026