NSR-S220D
Nikon's KrF scanner with the Streamlign Platform, achieving 230 wafers per hour or more and tool-to-tool overlay accuracy of 6 nm or less.
Maker: Nikon · Official product page
Specifications
| Light source and NA | KrF (248 nm), 0.82 |
|---|---|
| Resolution | 110 nm or less |
| Overlay accuracy | MMO 6 nm or less |
| Throughput | 230 wafers per hour or more (96 shots) |
Specifications as published by the maker. See the sources below.
Overview
NSR-S220D is Nikon's KrF scanner for 300 mm wafers. It uses the Streamlign Platform, which greatly raised productivity and accuracy, achieving throughput of 230 wafers per hour or more and tool-to-tool overlay accuracy (MMO) of 6 nm or less.
The extensible Streamlign Platform supports stable volume production of advanced devices across several generations and lower cost of ownership (CoO).
It has Bird's Eye Control, which measures the stage from directly above with high-precision encoders; Stream Alignment, which speeds up focus and alignment with straight-line AF and a 5-eye FIA; and Modular2 Structure, which shortens installation and maintenance. Resolution is 110 nm or less, NA 0.82, reduction ratio 1:4 and maximum exposure field 26 × 33 mm.
Key features
- 230 wafers per hour or more
- MMO of 6 nm or less
- Streamlign Platform
- Lower CoO
Applications
- Volume production exposure of KrF layers
Other duv lithography systems
- FPA-3030EX6 · Canon
- FPA-6300ES6a · Canon
- FPA-6300ESW · Canon
- NSR-S215D · Nikon
- NSR-S322F · Nikon
- NSR-S333F · Nikon
- NSR-S625E · Nikon
- NSR-S635E · Nikon
More from Nikon
- AMI-5700 · Macro inspection equipment
- DSP-100 · Laser direct imaging systems
- Litho Booster · Overlay metrology
- NSR-2205iL1 · i-line steppers
- NSR-S636E · DUV lithography systems
- NSR-SF155 · i-line steppers
- OPTISTATION-3200 · Macro inspection equipment
Sources
Last updated: October 23, 2026