NSR-SF155
Nikon's i-line stepper. It processes 200 wafers per hour or more with resolution of 280 nm or less.
Maker: Nikon · Official product page
Specifications
| Light source | i-line (365 nm) |
|---|---|
| Numerical aperture (NA) | 0.62 |
| Resolution | 280 nm or less |
| Throughput | 200 wafers per hour or more |
| Overlay accuracy | 25 nm or less |
| Related models | NSR-2205iL1 (resolution 350 nm or less) |
Specifications as published by the maker. See the sources below.
Overview
NSR-SF155 is Nikon's i-line stepper. It uses the i-line (365 nm) of a mercury lamp as its light source and achieves resolution of 280 nm or less with a numerical aperture of 0.62.
Throughput is 200 wafers per hour or more, and overlay accuracy is 25 nm or less. i-line exposure is not used for critical layers at advanced nodes, but it is widely used for power devices, analog, MEMS, sensors and others, and for layers with relaxed dimensional requirements even in advanced devices.
Nikon's i-line steppers also include NSR-2205iL1, with resolution of 350 nm or less and NA 0.45. Nikon offers front-end lithography tools from ArF immersion scanners (such as NSR-S636E) to KrF scanners and i-line steppers.
Key features
- i-line (365 nm), NA 0.62, resolution of 280 nm or less
- Throughput of 200 wafers per hour or more
- Overlay accuracy of 25 nm or less
Applications
- Exposure for power devices, analog and MEMS
- Non-critical layers of advanced devices
Other i-line steppers
- FPA-3030i5a · Canon
- FPA-3030i6 · Canon
- FPA-3030iWa · Canon
- FPA-5550iX · Canon
- FPA-5550iZ2 · Canon
- NSR-2205iL1 · Nikon
More from Nikon
Sources
Last updated: October 23, 2026