Coater/developers
CLEAN TRACK™ LITHIUS Pro™
TEL's coater/developer that raises productivity while keeping a small footprint, greatly reducing the cleanroom area it occupies. It supports immersion lithography.
Specifications
| Type | Coating and developing (300 mm) |
|---|---|
| Key feature | Higher OEE, lower CoO and a smaller footprint |
| Related models | LITHIUS Pro-i |
Specifications as published by the maker. See the sources below.
Overview
CLEAN TRACK LITHIUS Pro is a coater/developer for 300 mm wafers from Tokyo Electron (TEL). It raises productivity while keeping the tool footprint small, greatly reducing the cleanroom area it occupies compared with earlier tools.
It has TEL's own technology for its core concept of higher OEE (overall equipment efficiency) and lower CoO (cost of ownership).
New processes and modules let it support leading-edge immersion lithography. A LITHIUS Pro-i version is also available.
Key features
- Smaller cleanroom footprint
- Higher OEE and lower CoO
- Supports immersion lithography
Applications
- Resist coating and developing for ArF immersion
Other coater/developers
- DT-3000 (SOKUDO DUO) · SCREEN Holdings
- RF-200EX / RF-300EX · SCREEN Holdings
- SC-80EX · SCREEN Holdings
- SK-60EX / SK-80EX · SCREEN Holdings
- CLEAN TRACK™ LITHIUS Pro™ AP · Tokyo Electron (TEL)
- CLEAN TRACK LITHIUS Pro DICE · Tokyo Electron (TEL)
- CLEAN TRACK™ LITHIUS Pro™ V · Tokyo Electron (TEL)
- CLEAN TRACK LITHIUS Pro Z · Tokyo Electron (TEL)
More from Tokyo Electron (TEL)
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- ANTARES™ · Dry cleaning equipment
- Cellcia™ · Wafer probers
- CELLESTA™-i · Single-wafer cleaning equipment
- CELLESTA™-i MD · Single-wafer cleaning equipment
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
Sources
Last updated: October 23, 2026