CLEAN TRACK™ LITHIUS Pro™ AP
TEL's coater/developer optimized for next-generation packaging, with support for high-viscosity materials and spin-on hard masks.
Specifications
| Type | Coating and developing (300 mm) |
|---|---|
| Supported materials | High-viscosity materials, spin-on hard mask |
| Main applications | Advanced packaging |
Specifications as published by the maker. See the sources below.
Overview
CLEAN TRACK LITHIUS Pro AP is a coater/developer for 300 mm wafers from Tokyo Electron (TEL). It handles high-viscosity materials and spin-on hard mask materials, and is optimized for the process steps needed in next-generation packaging technology.
It carries on the concept of the widely used CLEAN TRACK ACT 12, with hardware and processes optimized for packaging.
It uses the new transfer system with an alignment function and the thin spin module introduced on LITHIUS Pro Z, further improving reliability, productivity and yield. It helps raise productivity and yield not only in advanced front-end processes but also in the packaging market.
Key features
- Supports high-viscosity materials and spin-on hard masks
- Transfer system with an alignment function
- Thin spin module
Applications
- Resist coating and developing for advanced packaging
Other coater/developers
- DT-3000 (SOKUDO DUO) · SCREEN Holdings
- RF-200EX / RF-300EX · SCREEN Holdings
- SC-80EX · SCREEN Holdings
- SK-60EX / SK-80EX · SCREEN Holdings
- CLEAN TRACK™ LITHIUS Pro™ · Tokyo Electron (TEL)
- CLEAN TRACK LITHIUS Pro DICE · Tokyo Electron (TEL)
- CLEAN TRACK™ LITHIUS Pro™ V · Tokyo Electron (TEL)
- CLEAN TRACK LITHIUS Pro Z · Tokyo Electron (TEL)
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- CELLESTA™-i MD · Single-wafer cleaning equipment
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
Sources
Last updated: October 23, 2026