VM-2500 / VM-3500
An optical interference film thickness measurement system suited to multi-point measurement across the wafer, for devices such as communication devices. 160 wafers per hour in high-speed mode.
Maker: SCREEN Holdings · Official product page
Specifications
| Type | Optical interference (spectral reflectance) |
|---|---|
| Throughput | 160 wafers per hour in high-speed mode (SiO₂, 5 points) |
| Key feature | Trench measurement mechanism (VM-3500) |
Specifications as published by the maker. See the sources below.
Overview
VM-2500/VM-3500 are SCREEN's optical interference film thickness measurement systems. They are suited to multi-point measurement across the wafer for devices such as communication devices.
High-speed mode achieves high throughput of 160 wafers per hour (SiO₂, 5-point measurement). A model with a full-surface vacuum stage that raises throughput for multi-point measurement is also available.
A log storage function supports maintenance, and the design emphasizes ease of maintenance by users. Creating recipes and entering optical constants is easy, and the standard OS is Windows 10. VM-3500 can carry a trench measurement mechanism to measure both film thickness and trenches in one tool.
Key features
- High-speed mode at 160 wafers per hour
- Full-surface vacuum stage (optional)
- Trench measurement (VM-3500)
Applications
- Film thickness control for communication devices
- Multi-point measurement across the wafer
Other film thickness metrology
- VM-1020 · SCREEN Holdings
- VM-1200 / VM-1300 · SCREEN Holdings
More from SCREEN Holdings
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- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- FC-3100 · Batch wafer cleaning equipment
- FC-821L · Batch wafer cleaning equipment
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
Sources
Film thickness metrology
Last updated: October 23, 2026