CLEAN TRACK™ LITHIUS Pro™ V

Specifications

Specifications as published by the maker. See the sources below.

Overview

CLEAN TRACK LITHIUS Pro V is a coater/developer for 300 mm wafers from Tokyo Electron (TEL). It develops the design concept of the widely adopted LITHIUS Pro.

Besides higher throughput, it pushes overall equipment efficiency (OEE) to the limit to maximize the number of wafers processed per day.

It is also extensible to processes such as double patterning, supporting efficient production at leading-edge fabs. A LITHIUS Pro V-i version is also available.

Key features

• Maximum OEE
• Maximum wafers processed per day
• Extensible to double patterning

Applications

• Resist coating and developing for ArF immersion
• Double patterning

Other coater/developers

• DT-3000 (SOKUDO DUO) · SCREEN Holdings
• RF-200EX / RF-300EX · SCREEN Holdings
• SC-80EX · SCREEN Holdings
• SK-60EX / SK-80EX · SCREEN Holdings
• CLEAN TRACK™ LITHIUS Pro™ · Tokyo Electron (TEL)
• CLEAN TRACK™ LITHIUS Pro™ AP · Tokyo Electron (TEL)
• CLEAN TRACK LITHIUS Pro DICE · Tokyo Electron (TEL)
• CLEAN TRACK LITHIUS Pro Z · Tokyo Electron (TEL)

All coater/developers and Japanese suppliers

More from Tokyo Electron (TEL)

• ALPHA-8SE™ i · Diffusion furnaces
• ANTARES™ · Dry cleaning equipment
• Cellcia™ · Wafer probers
• CELLESTA™-i · Single-wafer cleaning equipment
• CELLESTA™-i MD · Single-wafer cleaning equipment
• CELLESTA™ MS2 · Wafer scrubbers
• CELLESTA™ Pro SPM · Wet resist strip equipment
• CELLESTA™ SCD · Wafer dryers

Sources

1. TEL: LITHIUS series product page

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