DUV lithography systems

FPA-6300ES6a

Canon's high-productivity KrF scanner. It processes 300 wafers per hour or more with overlay accuracy of 5 nm or less, among the best for KrF scanners.

Maker: Canon · Official product page

Specifications


Light source and resolutionKrF 248 nm, 90 nm or less
NA and field size0.86 to 0.50 (automatically variable), 26 × 33 mm
Overlay accuracy5 nm or less (with options)

Specifications as published by the maker. See the sources below.

Overview


FPA-6300ES6a is Canon's high-productivity KrF scanner. New reticle and wafer stages speed up exposure, and improved alignment sequences and shorter wafer transfer times deliver high productivity of 300 wafers or more per hour (with options, 300 mm, 96 shots).

Vibration damping for the stages, stage synchronization control, an improved alignment scope and precise temperature control of the wafer and reticle stage areas achieve overlay accuracy of 5 nm or less (with options), among the best in the industry for a KrF scanner.

Improved durability and maintainability reduce downtime compared with the earlier tool, raising uptime further. Resolution is 90 nm or less, NA is automatically variable from 0.86 to 0.50, the reduction ratio is 1:4 and the field size is 26 × 33 mm, and it handles 200 mm and 300 mm wafers.

Key features


Applications


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More from Canon


Sources


  1. Canon: FPA-6300ES6a product page

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DUV lithography systems

Last updated: October 23, 2026