ALD equipment
ALD (atomic layer deposition) equipment builds films one atomic layer at a time by exposing the wafer to precursor gases in alternating, self-limiting steps. This gives precise thickness control and uniform coverage even on deep, narrow structures.
What it does
ALD is used for high-k gate dielectrics, spacers, liners and the films inside 3D NAND and DRAM capacitors. Tools come as single-wafer, batch and semi-batch systems.
Products (5)
- Advanced TSURUGI · Kokusai Electric
KOKUSAI ELECTRIC's mini-batch deposition system with a new reactor for 3D stacked devices. Footprint is 10% smaller than the previous model.
- Advanced TSURUGI Plus-Ⅲ · Kokusai Electric
KOKUSAI ELECTRIC's top deposition system model. A mini-batch thermal process system that combines difficult deposition on 3D stacked devices with high productivity.
- TSURUGI-C²® · Kokusai Electric
KOKUSAI ELECTRIC's mini-batch thermal process system. A reactor with minimized volume combines difficult film deposition with high productivity.
- NT333™ · Tokyo Electron (TEL)
Tokyo Electron's semi-batch deposition system that separates the precursor adsorption and reaction spaces with a gas curtain, completing one ALD cycle per table rotation.
- TELINDY PLUS™ IRad™ · Tokyo Electron (TEL)
Tokyo Electron's ALD system that adds a plasma source to the TELINDY PLUS 300 mm batch thermal processing system for very low-temperature deposition without plasma damage.
Japanese makers in this category
- Kokusai Electric · 3 product(s) listed
- Tokyo Electron (TEL) · 2 product(s) listed
Other front-end equipment
Sources
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Japanese equipment by category
Last updated: October 23, 2026