SS-3200
A scrubber-type single-wafer cleaning system with more than 500 units installed worldwide. It nearly doubles the capacity of the previous SS-3100.
Maker: SCREEN Holdings · Official product page
Specifications
| Cleaning method | Brush scrub + Nanospray (two-fluid) |
|---|---|
| Wafer size | 300 mm (SS-3200 for 200mm for 200 mm) |
| Configuration | Up to 8 chambers, up to 800 wafers per hour |
| Main applications | Damage-free physical cleaning of fine patterns |
Specifications as published by the maker. See the sources below.
Overview
SS-3200 is SCREEN's spin scrubber (a scrubber-type single-wafer cleaning system). It handles 300 mm wafers.
It carries the NanosprayÅ spray cleaning system, cleaning fine patterns without damaging them. It has up to 8 processing chambers, and an advanced transfer mechanism and SCREEN's own algorithms process up to 800 wafers per hour. That is about twice the previous SS-3100.
Its footprint is almost the same as the earlier tool, and careful choice of materials and particle control raise cleanliness for next-generation processes.
Key features
- Damage-free cleaning with Nanospray Å
- Up to 8 chambers and up to 800 wafers per hour
- About twice the throughput of the previous model
Applications
- Physical cleaning of fine patterns
- Particle removal from 300 mm wafers
Other wafer scrubbers
- SB-3300 · SCREEN Holdings
- SS-3300S · SCREEN Holdings
- SS-80EX · SCREEN Holdings
- CELLESTA™ MS2 · Tokyo Electron (TEL)
- NS300Z · Tokyo Electron (TEL)
More from SCREEN Holdings
- CW-2000 · Batch wafer cleaning equipment
- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- FC-3100 · Batch wafer cleaning equipment
- FC-821L · Batch wafer cleaning equipment
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
Sources
Wafer scrubbers
Last updated: October 23, 2026