Wafer scrubbers
Wafer scrubbers remove particles physically, with rotating brushes, two-fluid sprays of water and gas, or both, while the wafer spins. Some also clean the wafer back side and bevel, where particles can transfer to other tools and wafers.
What it does
Scrubbing is used after CMP, before lithography and in many other steps where particles must be removed without chemicals that would attack the films.
Products (6)
- SB-3300 · SCREEN Holdings
A wafer backside cleaning system that performs brush cleaning and chemical etching and cleaning at the same time. It is also used to reduce warpage.
- SS-3200 · SCREEN Holdings
A scrubber-type single-wafer cleaning system with more than 500 units installed worldwide. It nearly doubles the capacity of the previous SS-3100.
- SS-3300S · SCREEN Holdings
A spin scrubber that was the first scrubber-type tool to carry up to 16 chambers, processing up to 1,000 wafers per hour.
- SS-80EX · SCREEN Holdings
A spin scrubber that carries on the stability of the SS series. Up to 160 wafers per hour with 2 to 6 spin heads.
- CELLESTA™ MS2 · Tokyo Electron (TEL)
TEL's cleaning system that performs physical cleaning with two-fluid spray and brushes and processes both sides of the wafer at the same time.
- NS300Z · Tokyo Electron (TEL)
TEL's scrubber cleaning system for 300 mm wafers. It uses proven process modules and offers higher productivity.
Japanese makers in this category
- SCREEN Holdings · 4 product(s) listed
- Tokyo Electron (TEL) · 2 product(s) listed
Other front-end equipment
Sources
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Last updated: October 23, 2026