SS-3300S
A spin scrubber that was the first scrubber-type tool to carry up to 16 chambers, processing up to 1,000 wafers per hour.
Maker: SCREEN Holdings · Official product page
Specifications
| Configuration | Up to 16 chambers, dual transfer |
|---|---|
| Capacity | Up to 1,000 wafers per hour |
| Key feature | 27% smaller footprint than two SS-3200 tools |
Specifications as published by the maker. See the sources below.
Overview
SS-3300S is SCREEN's spin scrubber. It uses a new platform that can carry up to 16 chambers, an industry first for scrubber-type tools (as of December 2020, according to SCREEN).
A new dual transfer system greatly raises output per unit of tool area, achieving a processing capacity of up to 1,000 wafers per hour, among the highest in the industry. Compared with installing two 8-chamber SS-3200 tools side by side, footprint is 27% smaller.
A renewed control system supports smart factory functions such as IoT connectivity and coordination between tools. An optional exhaust recirculation system cuts total exhaust volume by 65% compared with earlier tools.
Key features
- Up to 16 chambers
- Up to 1,000 wafers per hour
- 27% smaller footprint
- 65% less exhaust (optional)
Applications
- Brush cleaning of wafers
Other wafer scrubbers
- SB-3300 · SCREEN Holdings
- SS-3200 · SCREEN Holdings
- SS-80EX · SCREEN Holdings
- CELLESTA™ MS2 · Tokyo Electron (TEL)
- NS300Z · Tokyo Electron (TEL)
More from SCREEN Holdings
- CW-2000 · Batch wafer cleaning equipment
- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- FC-3100 · Batch wafer cleaning equipment
- FC-821L · Batch wafer cleaning equipment
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
Sources
Wafer scrubbers
Last updated: October 23, 2026