Single-wafer cleaning equipment
Single-wafer cleaning equipment treats one wafer at a time in a spinning chamber, spraying chemicals and rinse water and then drying the wafer. Production tools stack many chambers to reach high throughput.
What it does
Each wafer gets the same, precisely controlled treatment, which makes single-wafer cleaning standard at advanced nodes where cleaning is repeated dozens of times in the process flow.
Products (4)
- SU-2000 · SCREEN Holdings
A cost-conscious single-wafer cleaning system for green devices such as power semiconductors and MEMS, inheriting technology from the high-end SU-3200.
- SU-3300 · SCREEN Holdings
SCREEN's single-wafer cleaning system. It carries up to 24 chambers in 4 levels × 6 towers and performs chemical wet etching and cleaning with high productivity.
- CELLESTA™-i · Tokyo Electron (TEL)
Tokyo Electron's single-wafer cleaning system for 300 mm wafers. It carries up to 20 cleaning chambers to raise productivity per unit of cleanroom floor area.
- CELLESTA™-i MD · Tokyo Electron (TEL)
TEL's single-wafer cleaning system for cleaning processes at 10 nm and below. Its own IPA dispensing technology suppresses pattern collapse.
Japanese makers in this category
- SCREEN Holdings · 2 product(s) listed
- Tokyo Electron (TEL) · 2 product(s) listed
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Single-wafer cleaning equipment
Last updated: October 23, 2026