CLEAN TRACK LITHIUS Pro DICE

Specifications

Specifications as published by the maker. See the sources below.

Overview

CLEAN TRACK LITHIUS Pro DICE is the newest 300 mm coater/developer from Tokyo Electron. It handles resist coating, developing and the various bake steps, and is connected inline to the exposure tool.

It supports EUV processes including High-NA, and can run EUV, immersion, ArF, KrF, i-line and SOC processes. Inline throughput is 440 wph, the highest in the series. It adds defect control technology and expanded collection of tool data.

The LITHIUS series builds on the technology of the CLEAN TRACK ACT series, which held a high market share, and its core concept is higher OEE (overall equipment efficiency) and lower CoO (cost of ownership). The previous model, LITHIUS Pro Z, targets the 10 nm node and below with an inline throughput of 300 wph.

Key features

• Supports EUV processes including High-NA EUV
• Inline throughput of 440 wph, the highest in the series
• Defect control technology and expanded tool data collection

Applications

• Resist coating, developing and baking for EUV and High-NA EUV
• Advanced lithography such as ArF immersion

Other coater/developers

• DT-3000 (SOKUDO DUO) · SCREEN Holdings
• RF-200EX / RF-300EX · SCREEN Holdings
• SC-80EX · SCREEN Holdings
• SK-60EX / SK-80EX · SCREEN Holdings
• CLEAN TRACK™ LITHIUS Pro™ · Tokyo Electron (TEL)
• CLEAN TRACK™ LITHIUS Pro™ AP · Tokyo Electron (TEL)
• CLEAN TRACK™ LITHIUS Pro™ V · Tokyo Electron (TEL)
• CLEAN TRACK LITHIUS Pro Z · Tokyo Electron (TEL)

All coater/developers and Japanese suppliers

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Sources

1. Tokyo Electron: LITHIUS series product page

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