NLD-5700
A production dry etching system for optical devices and MEMS with NLD plasma.
Maker: ULVAC · Official product page
Specifications
| Type | Magnetic neutral loop discharge (NLD) plasma |
|---|---|
| Configuration | Cassette chamber as standard; etching and ashing chambers can be added |
| Target | Quartz, glass, crystal quartz, LN and LT substrates |
Specifications as published by the maker. See the sources below.
Overview
NLD-5700 is ULVAC's dry etching system for optical devices and MEMS. It uses low-pressure, low-electron-temperature, high-density plasma from ULVAC's own magnetic neutral loop discharge (NLD).
A cassette chamber is standard, and adding an aligner makes it usable as a production tool. Etching and ashing chambers can also be added.
Because NLD produces plasma that is denser and has a lower electron temperature at lower pressure than ICP, it can process quartz, glass, crystal quartz, LN and LT substrates. It is used to make optical devices, microlenses, photonic crystals and μ-TAS flow channels.
Key features
- NLD plasma
- Cassette chamber for production
- Additional chambers can be added
Applications
- Production processing of optical devices and MEMS
Other mems manufacturing equipment
- HA7200 · Advantest
- HA7300 · Advantest
- ASE-Pegasus · SPP Technologies
- Tactras™ · Tokyo Electron (TEL)
- NLD-570 · ULVAC
More from ULVAC
- CC-200 · PECVD equipment
- CCMT-D series · Vacuum gauges
- CME · PECVD equipment
- CME-200E · CVD equipment
- CS · Sputtering equipment
- ei-5 · Vacuum evaporation equipment
- ei-5 / EVD-600LP · Vacuum evaporation equipment
- ENTRON-EX W300 · PVD equipment
Sources
MEMS manufacturing equipment
Last updated: October 23, 2026