PELMIS series
An EUV pellicle particle inspection system that inspects particles on the pellicle of pellicle-mounted EUV masks and automatically determines which side they are on.
Maker: Lasertec · Official product page
Specifications
| Target | Pellicle-mounted EUV masks (pellicle surface, pattern surface, periphery) |
|---|---|
| Functions | Automatic front/back side judgment, die comparison, mask-to-mask comparison |
| Announced | December 2024 |
Specifications as published by the maker. See the sources below.
Overview
The PELMIS series is Lasertec's EUV pellicle particle inspection system, announced in December 2024. It classifies EUV pellicle defects with high performance.
On pellicle-mounted EUV masks, it inspects particles on the pellicle and automatically determines whether each particle is on the front or the back of the pellicle.
Besides the pellicle, it inspects particles on the mask pattern surface and pattern periphery, and supports die comparison and mask-to-mask comparison inspection. It is used to inspect EUV pellicles and mask pattern surfaces at wafer fabs and for particle inspection in EUV mask manufacturing at mask shops.
Key features
- Particle inspection of the pellicle surface
- Automatic front/back side judgment
- Mask-to-mask comparison
Applications
- Particle inspection of EUV pellicles
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026