NLD-570
A dry etching system that processes quartz, glass, LN, LT and other materials with ULVAC's own magnetic neutral loop discharge (NLD) plasma.
Maker: ULVAC · Official product page
Specifications
| Type | Magnetic neutral loop discharge (NLD) plasma: low pressure, low electron temperature, high density |
|---|---|
| Target | Quartz, glass, crystal quartz, LN and LT substrates |
| Main applications | Optical devices, microlenses, photonic crystals, μ-TAS |
Specifications as published by the maker. See the sources below.
Overview
NLD-570 is a dry etching system from ULVAC. It uses low-pressure, low-electron-temperature, high-density plasma from ULVAC's own magnetic neutral loop discharge (NLD).
NLD produces plasma that is denser and has a lower electron temperature at lower pressure than ICP, allowing processing of quartz, glass, crystal quartz, LN and LT substrates. It etches with excellent profile control and surface smoothness.
Chamber maintenance is simple and efficient. It covers a wide range of processes from mask etching to quartz and glass etching, and is used to make optical devices such as diffraction gratings, modulators, optical waveguides and optical switches, as well as convex and concave microlenses, photonic crystals and μ-TAS flow channels.
Key features
- Magnetic neutral loop discharge (NLD) plasma
- Processes quartz, glass, LN and LT
- Etching with excellent surface smoothness
Applications
- Processing of optical devices
- Microlenses and μ-TAS
Other mems manufacturing equipment
- HA7200 · Advantest
- HA7300 · Advantest
- ASE-Pegasus · SPP Technologies
- Tactras™ · Tokyo Electron (TEL)
- NLD-5700 · ULVAC
More from ULVAC
- CC-200 · PECVD equipment
- CCMT-D series · Vacuum gauges
- CME · PECVD equipment
- CME-200E · CVD equipment
- CS · Sputtering equipment
- ei-5 · Vacuum evaporation equipment
- ei-5 / EVD-600LP · Vacuum evaporation equipment
- ENTRON-EX W300 · PVD equipment
Sources
MEMS manufacturing equipment
Last updated: October 23, 2026