Mask inspection equipment
MZ100
A mask edge inspection system that inspects the edges (side faces and bevels) of EUV and DUV photomasks with confocal optics.
Maker: Lasertec · Official product page
Specifications
| Type | Confocal optics |
|---|---|
| Inspection area | All areas except the central 146 × 146 mm of the mask (side faces and bevels) |
| Target | EUV and DUV photomasks |
Specifications as published by the maker. See the sources below.
Overview
MZ100 is Lasertec's mask edge inspection system, announced in June 2021. It handles EUV and DUV photomasks for advanced semiconductors.
Confocal optics provide high-sensitivity inspection and accurate measurement. It covers the edge of the photomask (side faces and bevels) and can inspect every area except the central 146 × 146 mm of the mask.
It is used for inspecting edge defects, reviewing defects, measuring defect size and height, and monitoring various process variations.
Key features
- Inspection of mask edges and bevels
- Confocal optics
- Measurement of defect size and height
Applications
- Edge defect inspection of photomasks
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026