GT66A
Gigaphoton's light source for ArF immersion lithography. Designed for the 5 nm node and beyond, it entered full operation in 2021.
Maker: Gigaphoton · Official product page
Specifications
| Laser type | ArF excimer (for immersion lithography) |
|---|---|
| Key feature | 30% lower speckle contrast, 30% longer maintenance interval |
| Main applications | ArF immersion lithography light source for 5 nm and beyond |
Specifications as published by the maker. See the sources below.
Overview
GT66A is Gigaphoton's light source (excimer laser) for ArF immersion lithography. Announced on October 27, 2021, it supports semiconductor manufacturing at the 5 nm node and next-generation nodes.
Cutting speckle contrast by 30% reduces edge placement error (EPE) in exposed patterns and suppresses line edge roughness (LER) and line width roughness (LWR) of fine patterns. The finer the patterns, the more the properties of the light source affect pattern quality.
Highly durable parts extend the maintenance cycle by 30%, raising tool availability and productivity. It is aimed at producing semiconductors for high-end devices used in autonomous driving, high-performance servers and similar applications.
Key features
- Light source for ArF immersion lithography
- 30% lower speckle contrast
- Suppresses LER, LWR and EPE
- 30% longer maintenance cycle
Applications
- ArF immersion lithography for the 5 nm node and beyond
Sources
Equipment components and subsystems: more products
Last updated: October 23, 2026