NSR-S625E
Nikon's ArF immersion scanner for mid-critical layers. Throughput is about 1.3 times the previous model, and it carries iAS.
Maker: Nikon · Official product page
Specifications
| Light source and NA | ArF immersion (193 nm), 1.35 |
|---|---|
| Resolution | 38 nm or less |
| Overlay accuracy | MMO 2.5 nm or less |
| Throughput | 280 wafers per hour or more (96 shots) |
Specifications as published by the maker. See the sources below.
Overview
NSR-S625E is Nikon's ArF immersion scanner for mid-critical layers. It carries on the proven Streamlign Platform and is designed for producing advanced semiconductor structures.
Throughput is about 1.3 times that of the previous NSR-S622D, and operating stability is also much better. It also carries the inline Alignment Station (iAS), which performs multi-point alignment on every shot without lowering throughput to improve overlay accuracy.
Resolution is 38 nm or less, NA 1.35, reduction ratio 1:4 and maximum exposure field 26 × 33 mm. Same-model overlay accuracy (MMO) is 2.5 nm or less, and throughput is 280 wafers per hour or more (96 shots).
Key features
- About 1.3 times the throughput of the previous model
- Carries iAS
- Carries on the Streamlign Platform
Applications
- Volume production exposure of mid-critical layers
Other duv lithography systems
- FPA-3030EX6 · Canon
- FPA-6300ES6a · Canon
- FPA-6300ESW · Canon
- NSR-S215D · Nikon
- NSR-S220D · Nikon
- NSR-S322F · Nikon
- NSR-S333F · Nikon
- NSR-S635E · Nikon
More from Nikon
- AMI-5700 · Macro inspection equipment
- DSP-100 · Laser direct imaging systems
- Litho Booster · Overlay metrology
- NSR-2205iL1 · i-line steppers
- NSR-S636E · DUV lithography systems
- NSR-SF155 · i-line steppers
- OPTISTATION-3200 · Macro inspection equipment
Sources
Last updated: October 23, 2026