NSR-S322F
Nikon's ArF (dry) scanner with the Streamlign Platform proven on immersion tools.
Maker: Nikon · Official product page
Specifications
| Light source and NA | ArF dry (193 nm), 0.92 |
|---|---|
| Resolution | 65 nm or less |
| Overlay accuracy | MMO 5 nm or less |
| Throughput | 230 wafers per hour or more (250 or more with options) |
Specifications as published by the maker. See the sources below.
Overview
NSR-S322F is Nikon's ArF (dry) scanner. It carries the Streamlign Platform proven on immersion tools, further raising overlay accuracy and productivity to meet production lines' needs for higher precision and stable volume production.
Streamlign Platform has been used in Nikon lithography systems since 2008. Bird's Eye Control measures scales on the stage directly from above with high-precision encoders and controls the stage precisely with hybrid measurement combined with interferometers. The reticle stage also uses planar encoders to reduce the effect of air fluctuation.
Stream Alignment maps the wafer surface in one pass with straight-line AF that spans the wafer diameter, and increases alignment measurement points with a 5-eye FIA (Field Image Alignment). Modular2 Structure modularizes the tool unit by unit, shortening installation and improving maintainability. Resolution is 65 nm or less, and MMO is 5 nm or less.
Key features
- Streamlign Platform
- Bird's Eye Control
- Stream Alignment
- Modular2 Structure
Applications
- Volume production exposure of ArF dry layers
Other duv lithography systems
- FPA-3030EX6 · Canon
- FPA-6300ES6a · Canon
- FPA-6300ESW · Canon
- NSR-S215D · Nikon
- NSR-S220D · Nikon
- NSR-S333F · Nikon
- NSR-S625E · Nikon
- NSR-S635E · Nikon
More from Nikon
- AMI-5700 · Macro inspection equipment
- DSP-100 · Laser direct imaging systems
- Litho Booster · Overlay metrology
- NSR-2205iL1 · i-line steppers
- NSR-S636E · DUV lithography systems
- NSR-SF155 · i-line steppers
- OPTISTATION-3200 · Macro inspection equipment
Sources
Last updated: October 23, 2026