Front-end equipment

DUV lithography systems

DUV lithography equipment projects a reduced image of a mask pattern onto the wafer with deep ultraviolet light from KrF (248 nm) or ArF (193 nm) excimer lasers. ArF immersion scanners, which place water between the lens and the wafer, print the finest DUV patterns, often combined with multiple patterning.

What it does


DUV scanners and steppers expose most layers of a chip, including at advanced nodes where EUV is used only for the most critical layers, so throughput and overlay accuracy are as important as resolution.

Products (10)


Japanese makers in this category


Other front-end equipment


Sources


  1. Canon: FPA-3030EX6 product page
  2. Canon: FPA-6300ES6a product page
  3. Canon: FPA-6300ESW product page
  4. Nikon: NSR-S215D product page
  5. Nikon: NSR-S220D product page
  6. Nikon: NSR-S322F product page
  7. Nikon: NSR-S333F product page
  8. Nikon: NSR-S625E product page
  9. Nikon: NSR-S635E product page
  10. NSR-S635E catalog (PDF)
  11. Nikon: NSR-S636E product page

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DUV lithography systems

Last updated: October 23, 2026