NSR-S636E
Nikon's ArF immersion scanner for critical layers that combines overlay accuracy and throughput at a high level.
Maker: Nikon · Official product page
Specifications
| Light source and NA | ArF immersion (193 nm), 1.35 |
|---|---|
| Resolution | 38 nm or less |
| Overlay accuracy | MMO 2.1 nm or less |
| Throughput | 280 wafers per hour or more (96 shots) |
Specifications as published by the maker. See the sources below.
Overview
NSR-S636E is Nikon's ArF immersion scanner for critical layers. It combines overlay accuracy and throughput at a high level, achieving the highest productivity among Nikon's semiconductor lithography systems.
The inline Alignment Station (iAS), carried over from earlier models, has been further improved to measure and correct wafer warpage and distortion more accurately while keeping throughput high. iAS builds an alignment station inline inside the exposure tool, allowing multi-point alignment on every shot without lowering throughput.
Less downtime also improves overall productivity. Resolution is 38 nm or less, NA 1.35, reduction ratio 1:4 and maximum exposure field 26 × 33 mm; same-model overlay accuracy (MMO) is 2.1 nm or less, and throughput is 280 wafers per hour or more (96 shots).
Key features
- Improved iAS corrects warpage and distortion
- MMO of 2.1 nm or less
- 280 wafers per hour or more
- Nikon's highest productivity
Applications
- Critical layers of advanced logic and memory
Other duv lithography systems
- FPA-3030EX6 · Canon
- FPA-6300ES6a · Canon
- FPA-6300ESW · Canon
- NSR-S215D · Nikon
- NSR-S220D · Nikon
- NSR-S322F · Nikon
- NSR-S333F · Nikon
- NSR-S625E · Nikon
More from Nikon
- AMI-5700 · Macro inspection equipment
- DSP-100 · Laser direct imaging systems
- Litho Booster · Overlay metrology
- NSR-2205iL1 · i-line steppers
- NSR-S635E · DUV lithography systems
- NSR-SF155 · i-line steppers
- OPTISTATION-3200 · Macro inspection equipment
Sources
Last updated: October 23, 2026