NSR-S635E
Nikon's ArF immersion scanner with an integrated inline Alignment Station (iAS). The Streamlign platform gives high productivity.
Maker: Nikon · Official product page
Specifications
| Light source | ArF immersion (193 nm) |
|---|---|
| Numerical aperture (NA) | 1.35 |
| Resolution | 38 nm or less |
| Throughput | 275 wafers per hour or more (96 shots) |
| Overlay accuracy | MMO 2.1 nm or less |
| Related models | NSR-S636E (successor) |
Specifications as published by the maker. See the sources below.
Overview
NSR-S635E is Nikon's ArF immersion scanner. It was developed for volume production of leading-edge semiconductors and integrates an inline Alignment Station (iAS).
The light source is an ArF excimer laser with a wavelength of 193 nm, the numerical aperture is 1.35, the reduction ratio is 1:4 and the maximum exposure field is 26 × 33 mm. Resolution is 38 nm or less.
Using the efficiency of the Streamlign platform, it combines overlay accuracy of 2.1 nm or less MMO (mix-and-match overlay) with throughput of 275 wafers per hour or more at 96 shots. Nikon's lineup also includes the successor NSR-S636E (280 wafers per hour or more).
Key features
- ArF immersion, NA 1.35, resolution of 38 nm or less
- Integrated inline Alignment Station (iAS)
- Overlay accuracy of MMO 2.1 nm or less
- 275 wafers per hour or more (96 shots)
Applications
- Volume production exposure for advanced logic and memory
Other duv lithography systems
- FPA-3030EX6 · Canon
- FPA-6300ES6a · Canon
- FPA-6300ESW · Canon
- NSR-S215D · Nikon
- NSR-S220D · Nikon
- NSR-S322F · Nikon
- NSR-S333F · Nikon
- NSR-S625E · Nikon
More from Nikon
- AMI-5700 · Macro inspection equipment
- DSP-100 · Laser direct imaging systems
- Litho Booster · Overlay metrology
- NSR-2205iL1 · i-line steppers
- NSR-S636E · DUV lithography systems
- NSR-SF155 · i-line steppers
- OPTISTATION-3200 · Macro inspection equipment
Sources
Last updated: October 23, 2026