Mask inspection equipment
MATRICS X9ULTRA series
A mask inspection system dedicated to EUV masks without pellicles. A high-power 193 nm laser and a high-NA objective detect tiny particles.
Maker: Lasertec · Official product page
Specifications
| Light source | High-power 193 nm laser |
|---|---|
| Target | EUV masks without pellicles |
| Announced | April 2022 |
Specifications as published by the maker. See the sources below.
Overview
The MATRICS X9ULTRA series is Lasertec's mask inspection system for EUV masks, announced in April 2022.
It is a mask inspection system dedicated to EUV masks without pellicles. A high-power 193 nm laser and a high-NA objective lens improve detection of tiny particles.
It is used for quality inspection of EUV masks without pellicles at wafer fabs and for inspecting tiny particles in EUV mask manufacturing.
Key features
- Dedicated to EUV masks without pellicles
- High-power 193 nm laser
- High-NA objective lens
Applications
- Inspection of tiny particles on EUV masks
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026