Diffusion furnaces
Diffusion furnaces are vertical batch furnaces that heat a stack of wafers in a controlled gas atmosphere. They are used for thermal oxidation, diffusion of dopants, annealing and batch deposition of films such as polysilicon and silicon nitride.
What it does
Processing many wafers at once makes furnaces efficient for long, high-temperature steps, and modern furnaces also run batch ALD.
Products (6)
- QUIXACE®-II · Kokusai Electric
KOKUSAI ELECTRIC's 300 mm large-batch thermal process system. Core technologies in temperature control, transfer, vacuum and gas replacement, and cooling shorten cycle time.
- ALPHA-8SE™ i · Tokyo Electron (TEL)
TEL's 200 mm vertical batch thermal deposition system, a 2018 renewal of the earlier model. It processes up to 150 wafers at a time.
- EVAROS™ · Tokyo Electron (TEL)
TEL's batch thermal deposition system that processes 200 wafers of 300 mm size at a time. It cuts CO₂ emissions per wafer by about 25% compared with TELINDY PLUS.
- TELFORMULA™ · Tokyo Electron (TEL)
TEL's 300 mm thermal processing and deposition system that minimizes turnaround time from wafer loading to unloading, a long-standing weakness of batch furnaces.
- TELINDY PLUS · Tokyo Electron (TEL)
Tokyo Electron's batch thermal processing system for 300 mm wafers. A flagship platform that handles oxidation, diffusion and deposition in a vertical furnace.
- H83 / H84 · ULVAC
A horizontal diffusion furnace with more than 30 years of track record. It is used for diffusion, thermal oxidation and annealing of 200 mm silicon wafers.
Japanese makers in this category
- Kokusai Electric · 1 product(s) listed
- Tokyo Electron (TEL) · 4 product(s) listed
- ULVAC · 1 product(s) listed
Other front-end equipment
Sources
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Last updated: October 23, 2026