H83 / H84
A horizontal diffusion furnace with more than 30 years of track record. It is used for diffusion, thermal oxidation and annealing of 200 mm silicon wafers.
Maker: ULVAC · Official product page
Specifications
| Type | Horizontal diffusion furnace (3- or 4-tube stack) |
|---|---|
| Wafer size and load | Up to 200 mm, 50 / 125 wafers |
| Temperature | Operating 600 to 1,200 °C, uniformity ±1.0 °C (5 independently controlled zones) |
Specifications as published by the maker. See the sources below.
Overview
H83/H84 are ULVAC's horizontal diffusion furnaces. Highly reliable tools with more than 30 years of track record, they are used for heat treatments such as diffusion, thermal oxidation and annealing of 200 mm silicon wafers.
Different processes can be chosen in one tool, and 3- or 4-tube stacks save installation space. Heaters in 5 zones are each controlled independently for temperature control with excellent uniformity and stability. ULVAC's own control system gives simple, reliable operation.
It can perform pyrogenic oxidation, wet oxidation, dry oxidation, phosphorus and boron diffusion using phosphorus oxychloride (POCl₃) and boron tribromide (BBr₃), annealing and other processes. Operating temperature is 600 to 1,200 °C, and temperature uniformity is ±1.0 °C.
Key features
- More than 30 years of track record
- Heaters with 5 independently controlled zones
- Space-saving 3- or 4-tube stacks
Applications
- Diffusion, thermal oxidation and annealing of silicon wafers
Other diffusion furnaces
- QUIXACE®-II · Kokusai Electric
- ALPHA-8SE™ i · Tokyo Electron (TEL)
- EVAROS™ · Tokyo Electron (TEL)
- TELFORMULA™ · Tokyo Electron (TEL)
- TELINDY PLUS · Tokyo Electron (TEL)
More from ULVAC
- CC-200 · PECVD equipment
- CCMT-D series · Vacuum gauges
- CME · PECVD equipment
- CME-200E · CVD equipment
- CS · Sputtering equipment
- ei-5 · Vacuum evaporation equipment
- ei-5 / EVD-600LP · Vacuum evaporation equipment
- ENTRON-EX W300 · PVD equipment
Sources
Diffusion furnaces
Last updated: October 23, 2026