MATRICS X810EX series
A high-sensitivity, high-speed, low-CoO defect inspection system for DUV masks. It scans a 100 mm square in 38 minutes.
Maker: Lasertec · Official product page
Specifications
| Light source | 213 nm QCW laser (over 400 mW, twice the previous model) |
|---|---|
| Scan time | 38 minutes per 100 × 100 mm |
| Supported masks | Cr, MoSi, OMOG (6 inch) |
Specifications as published by the maker. See the sources below.
Overview
The MATRICS X810EX series is Lasertec's defect inspection system for DUV masks. It offers high sensitivity, high speed and low cost of ownership.
A high-power 213 nm QCW laser (over 400 mW), twice the power of the previous model, raises sensitivity further, and a faster defect detection system scans a 100 mm × 100 mm area in 38 minutes.
It measures and visualizes the distribution of mask pattern dimensions (CD uniformity) at the same time as mask inspection. It supports RSP150 and RSP200 for fully automatic inspection linked to OHT. It handles 6-inch Cr, MoSi and OMOG masks.
Key features
- 213 nm QCW laser (twice the previous model)
- 38 minutes per 100 mm square
- Simultaneous CD uniformity measurement
Applications
- Incoming and pre-shipment inspection of photomasks
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026