Episode™ 2 DMR
TEL's single-wafer deposition platform that transfers and processes 2 wafers at the same time. It is used for TiN deposition in memory.
Specifications
| Type | Transfer and deposition of 2 wafers at once (DMR: Duo Matched Reactor) |
|---|---|
| Configuration | 1 to 4 chambers |
| Main applications | Capacitor electrodes, word line TiN and barrier metal |
Specifications as published by the maker. See the sources below.
Overview
Episode 2 is a 300 mm single-wafer deposition platform from Tokyo Electron (TEL) that transfers 2 wafers at the same time. It combines high productivity with a small footprint, helping raise fab productivity.
Its DMR (Duo Matched Reactor) process module deposits films on 2 wafers at once. It follows the Triase+ EX-II series, which is used by many memory makers, and adds new functions for devices that are moving further into 3D structures with higher aspect ratios.
It is used for ASFD TiN deposition for capacitor electrodes, word line TiN and barrier metal. It also has enhanced tool data collection and an edge computing system.
Key features
- Transfers and processes 2 wafers at once
- Follows Triase+ EX-II
- Supports high aspect ratios
Applications
- DRAM capacitor electrodes
- Word line TiN and barrier metal
Other cvd equipment
- QUIXACE®-II · Kokusai Electric
- Episode™ 1 · Tokyo Electron (TEL)
- Triase+™ EX-II™ TiN · Tokyo Electron (TEL)
- Triase+™ Ti/TiN · Tokyo Electron (TEL)
- Triase+™ W · Tokyo Electron (TEL)
- CME-200E · ULVAC
More from Tokyo Electron (TEL)
- ALPHA-8SE™ i · Diffusion furnaces
- ANTARES™ · Dry cleaning equipment
- Cellcia™ · Wafer probers
- CELLESTA™-i · Single-wafer cleaning equipment
- CELLESTA™-i MD · Single-wafer cleaning equipment
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
Sources
Last updated: October 23, 2026